I-LINE Datasheet(PDF) - AF2510G10ST - Schneider Electric

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I-LINE Datasheet, PDF

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Searched Keyword : 'I-LINE' - Total: 24265 (1/1214) Pages

Manufacturer	Part #	Datasheet	Description
Schneider Electric	AF2510G10ST	78Kb/2P	Straight Length - I-Line - 10ft
Schneider Electric	FC2IMA12C	50Kb/1P	US-SURGELOGIC I-LINE 208Y/120
Shindengen Electric Mfg...	D30XT80	465Kb/4P	Large I o Single In-line Package
Schneider Electric	SL1200P6	107Kb/2P	CIRCUIT BREAKER I-LINE SUBFEED LUG KIT
Nanjing Qinheng Microel...	CH423	209Kb/9P	2-line Remote I/O extension chip
Schneider Electric	SL1200P5	139Kb/1P	CIRCUIT BREAKER I-LINE SUBFEED LUG KIT
MPS Industries, Inc.	B3336G	176Kb/1P	VDSL LINE TRANSFORMER CONEXANT ACCELITY I CHIPSET
Omron Electronics LLC	V640	1Mb/12P	Line-up Ethernet I/F model newly.
Shindengen Electric Mfg...	D50XB80	437Kb/4P	Large I o Single In-line Package
Schneider Electric	FC1IMA12C	54Kb/1P	I-LINE TVSS UNIT 120/240,1PH,3WIRE,120KA
	FC1IMA24C	54Kb/1P	I-LINE TVSS UNIT 120/240,1PH,3WIRE,240KA
	FC3IMA16C	53Kb/1P	I-LINE TVSS UNIT 240/120,3PH,4WIRE,160KA
Asahi Kasei Microsystem...	AK4688EN	629Kb/36P	Asynchronous Stereo CODEC with Capless Line I/O
Schneider Electric	FC3IMA24C	54Kb/1P	I-LINE TVSS UNIT 240/120,3PH,4WIRE,240KA
Schneider Electric	FC4IMA12C	54Kb/1P	I-LINE TVSS UNIT 480Y/277V 3P 4WIRE 120K
ITT Industries	046594-0002	36Kb/1P	Product Line: MIL-DTL 26482 Series I & Mil Battery
Schneider Electric	FC4IMA24C	54Kb/1P	I-LINE TVSS UNIT 480Y/277V 3P 4WIRE 240K
MPS Industries, Inc.	B3337G	167Kb/1P	VDSL LINE TRANSFORMER CONEXANT ACCELITY, ACCELITY I & II CHIPSET
Schneider Electric	FC2IMA16C	54Kb/1P	I-LINE TVSS UNIT 208Y/120V 3P 4WIRE 160K
Integrated Device Techn...	IDT74LVC138A	87Kb/6P	3.3V CMOS 3-LINE TO 8-LINE DECODER/DEMULTIPLEXER WITH 5 VOLT TOLERANT I/O

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What is I-LINE

In electronic components, I-Line is one of the photolithography technologies used in the Integrated Circuit (IC) manufacturing process. Photolithography is a process that uses light to expose photosensitive materials to form circuit patterns on a semiconductor wafer. I-Line photolithography is used to create very fine circuit patterns using specific wavelengths of ultraviolet light.

Key features of I-Line photolithography
Wavelength: I-Line uses ultraviolet light at 365 nanometers (nm). This wavelength is shorter than G-Line (436 nm) and longer than deep ultraviolet (DUV) lithography (248 nm, 193 nm), providing intermediate resolution.
Resolution: I-Line photolithography primarily provides resolutions in the 0.35 micrometer (μm) to 0.5 μm range, which was primarily used in semiconductor manufacturing in the late 1990s and early 2000s.
Photoresist: The I-Line process uses I-Line photoresist, which undergoes a chemical change when exposed to ultraviolet rays to form a pattern.
Equipment: I-Line photolithography equipment uses an I-Line stepper or scanner to expose the wafer to light. This equipment is equipped with a high-precision lens system.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.

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